- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 7/028 - Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Patent holdings for IPC class G03F 7/028
Total number of patents in this class: 646
10-year publication summary
28
|
40
|
38
|
50
|
40
|
28
|
52
|
37
|
50
|
11
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
FUJIFILM Corporation | 27102 |
93 |
LG Chem, Ltd. | 17205 |
57 |
Samsung SDI Co., Ltd. | 6671 |
37 |
Tokyo Ohka Kogyo Co., Ltd. | 1481 |
24 |
DONGWOO FINE-CHEM Co., Ltd. | 1163 |
22 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
19 |
Samsung Display Co., Ltd. | 30585 |
15 |
Resonac Corporation | 2233 |
15 |
Kolon Industries, Inc. | 1506 |
14 |
JSR Corporation | 2476 |
13 |
Sumitomo Chemical Company, Limited | 8808 |
12 |
Toray Industries, Inc. | 6652 |
12 |
Cheil Industries Inc. | 944 |
10 |
Boe Technology Group Co., Ltd. | 35384 |
10 |
Samsung Electronics Co., Ltd. | 131630 |
8 |
Konica Minolta Medical & Graphic, Inc. | 986 |
8 |
Covestro Deutschland AG | 2429 |
8 |
Dongjin Semichem Co., Ltd. | 438 |
8 |
GLOBALFOUNDRIES U.S. Inc. | 6459 |
7 |
Rohm and Haas Electronic Materials Korea Ltd. | 546 |
7 |
Other owners | 247 |